Enables high-throughput, blank mask particle detection down to 0.1 μm; multiple substrate materials blank mask inspection capability.
● Sample size: 6 inch
● Sample case: Single pod or Multi slot
Detects particles on a wide range of mask and reticle. Enables high throughput with simple operation and 0.5 micron sensitivity. Microscopes with multiple magnification are built in for particle observation and image data can be stored in the system. Compact equipment design can save the installation space.
Features:
● Multi Surface inspection: Pattern/Glass/Pellicle
● Sample size: 5 inch/6 inch/7 inch/9 inch
● High throughput: Approx 15 min for 3 surface inspection
● Sample case handling: SMIF pod/stepper case
● Various option: Auto capture/Auto sizing function, OHT/AGV interface
Detects particles on leading edge pellicle membranes enabling high throughput inspection of multiple membrane materials. Customized adopter for Pellicle handling can be design and prepared.
Measurement result display
Capture image display
Automatically removes particles from reticles and pellicle surfaces with air / N2 blow and vacuum suction. Prevents the removed particles from re-adhering.
● Reduction of running costs
Removal of particles by routine use extends both the replacement cycle of the pellicle and the cleaning cycle of the mask.
Sample size: 6 inch
Sample case: SMIF Pod or Stepper case
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