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Nano-indented Silicon
System: LabRAM HR Evolution
Time per point: 400 ms
Step size: 100 nm
Data points: 2,450
Peak position image of Silicon after nano-indentation with a Berkovich indentor. The lattice strain is clearly visible around the indentation, causing a significant shift in the first order Silicon phonon, typically positioned at 520.7 cm-1 for a strain-free crystalline lattice.