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Semiconductors

Compound semiconductor wafer defect evaluation

Non-destructive wafer defect distribution evaluation using PL mapping

PL spectrum and PL life can be obtained with one device, allowing multifaceted evaluation.

Mapping image of photoluminescence peak intensity, wavelength, and half-width of a 2-inch compound semiconductor wafer

Full-surface high-speed defect evaluation of 3-inch InGaP wafers

Obtain PL information for over 10,000 items in minutes. The peak wavelength distribution is expressed as a histogram.

101x101 points imaging, measurement time 4' 9 (1msec. point)

GaN wafer defect classification evaluation

Mixed (edge and screw) dislocations are observed in CL image 1, and edge dislocations are observed in CL image 6. In this way, defect types can be evaluated by displaying three-dimensional intensity images based on wavelength.

Analysis of the same area using steady PL spectra and time-resolved measurements

With time-resolved measurement, it is possible to read slight differences in luminescent components that cannot be read in a steady PL spectrum.

Cathodoluminescence measurement system HORIBA CLUE series

  • Can be added to existing electron microscopes
  • Compatible with measurements at ultraviolet to near-infrared wavelengths (200 to 2,100 nm)
  • SEM integrated high range CL imaging device (Imaging CL) can also be proposed.

AFM (atomic force microscope) Raman XploRA Nano

  • Acquire physical information by AFM and chemical information by Raman simultaneously
  • Stress distribution analysis on the outermost surface on the order of nm is possible.

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