HORIBA's instruments can detect and analyse particles on photomask. For organic and polymer materials, RAMAN is used to analyze the detected foreign particles on a mask such as nylon, hair and cosmetic. For metal materials,XGT-9000 is used to analyze the detected foregin particles on a mask such as Ni, Al and Cr.
Ellipsometry is used to monitor thickness and optical constant (Réflective index (n) and Extinction Coefficient (k)) of pellicle on photomask.
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