Metal Organic Chemical Vapor Deposition (MOCVD)The MOCVD process is a recognized controllable synthesis method that uses a variety of precursors like Trimethyl Indium (TMI) and Diethyl Zinc (DEZ) that require a robust delivery method to ensure process repeatability and high yield.
Plasma Emission Control and Process Gas Monitoring for Dry Coating Process in Functional Glass ManufacturingHORIBA is one of the world's largest gas and liquid mass flow controller manufacturers, with a range of analogue, digital and high temperature mass flow controllers along with the point of use liquid source vaporization control and delivery systems.
